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US-Korea Workshop on Micro/Nano Integrative, Hybrid and Complex Systems US-Korea Workshop October 25-27, 2005

Facilities

Our laboratory boasts of state-of-the-art nano-electronic, nano-bio and nano E-beam source research equipment including many other equipment at AMERI (http://web.eng.fiu.edu/~ameri/Equipment_List.htm)

 
Field Emission Measurement System

  • Vacuum level up to 10-7 torr.

  • High voltage (5-20 kV) source for AC & DC measurements.

  • Kimball Physics 2-10 keV electron gun

 
Thermal Chemical Vapor Deposition System
  • Automated with quartz reaction chamber.
  • Automated sample loader and gas control.
Low Pressure Chemical vapor deposition system for  nanowire growth
 
  • Three temperature zones.
  • Low pressure of 0.02 Torr.
  • Fully automated.

 
E-beam Lithography System(JSM7000F)

  • High resolution 1.2nm (at 30 kV)

  • Magnification 10 to ¤500,000

  • Nabity E-beam writer

Four Probe Measurement System (4o to 400o K)

  • Probes up to 2" wafers.

  • CCD camera, light source,14" color monitor.

  • Vacuum, temperature control (4o to 400o K).

  • Agilent 4156C:Kelvin connections with high resolution SMUs.

 

Sensor System
  • RH and gas sensing using  Solartron Analytical 1260 Impedance Analyzer  via the lead wires.
 
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